Nanoimprint Lithography: Pattern Transfer and Manufacturing Readiness
Yenra | Updated September 17, 2026
Article: https://yenra.com/nano/nanoimprint.html

NANOIMPRINT PROCESS EVIDENCE RECORD
Purpose: compare claims at the same fabrication and inspection boundary.
Application: electronics / photonics / other
Source URL, date and authors/vendor:
Evidence stage: simulation / laboratory sample / equipment demonstration / qualified process
Template, resist/material, substrate and relevant area:
Process type and steps included in the reported result:
Feature size/uniformity and measurement method:
Overlay definition and measured locations:
Residual-layer thickness and variation:
Defect types/count, inspected area and detection limit:
Repeated-imprint count and template cleaning/lifetime evidence:
Downstream functional test and result:
Raw output rate, accepted fraction and time boundary:

ILLUSTRATION ONLY: 1,000 fields/h x 0.90 = 900 accepted fields/h; 1,200 x 0.70 = 840. Use comparable fields and criteria. This is not die yield or a factory forecast.
Unresolved assumptions and next evidence needed:

SOURCE REFERENCES
Canon’s process explanation
https://global.canon/en/technology/canon-tech/interview/nanoimprint/
NIST study of residual-layer thickness
https://www.nist.gov/publications/residual-layer-thickness-control-and-metrology-jet-and-flash-imprint-lithography
NIST’s nanoimprint metrology work
https://www.nist.gov/programs-projects/metrology-nanoimprint-lithography
Canon’s October 2023 FPA-1200NZ2C announcement
https://global.canon/en/news/2023/20231013.html