MICROELECTRONICS FILTRATION: EVALUATE CHEMISTRY, FLOW AND DEFECT EVIDENCE Editable planning/verification record — Yenra Updated: October 2, 2026 Article: https://yenra.com/making/filtration.html Purpose: Write a filter-evaluation brief connecting fluid compatibility, operating conditions and contamination evidence to the process. Intended reader: Semiconductor process engineers specifying point-of-use liquid filtration. HOW TO USE Save a working copy. Enter the actual specification, units, assumptions and evidence references in each field. Preserve original observations and record changes. Have the responsible reviewer resolve missing or conflicting requirements before release. Examples below are fictional teaching inputs, not process settings or acceptance standards. RECORD 1. Process point, chemistry/concentration, temperature in deg C and required flow in L/min: ____________________________________________________________ 2. Contaminant types, incoming baseline and analytical method limits: ____________________________________________________________ 3. Filter grade, retention test basis, construction, housing and seal compatibility: ____________________________________________________________ 4. Supplier pressure/temperature limits and approved conditioning procedure: ____________________________________________________________ 5. Upstream/downstream pressure in kPa and measured flow at matched conditions: ____________________________________________________________ 6. Extractables/particle results, blanks, sample points and sampling times: ____________________________________________________________ 7. Wafer defect evidence, comparator/control and concurrent process changes: ____________________________________________________________ 8. Replacement criteria, change-control owner and approved disposition: ____________________________________________________________ WORKED EXAMPLE AND LIMITS Fictional matched-condition readings: at 2.0 L/min, upstream pressure is 180 kPa and downstream is 140 kPa, so differential pressure is 40 kPa. Later, at the same flow and fluid temperature, 190 minus 130 = 60 kPa, a 20 kPa increase. Investigate using the approved limits; these invented pressures are not ratings or replacement thresholds. REVIEW Prepared by / date: ____________________ Reviewed by / date: ____________________ Open issues, responsible owner, due date: ____________________ Approved next action and evidence: ____________________ SOURCE CONTEXT These primary references support the linked article. Use exact applicable product, contract, and document versions for operational work. Entegris' contamination-control FAQ https://www.entegris.com/en/home/resources/technical-information/faq/contamination-control-in-ultrapure-chemicals-and-water.html Entegris' Torrento X specifications https://www.entegris.com/shop/en/USD/products/liquid-filtration-and-purification/liquid-filters/Torrento-X-Filter/p/TorrentoXFilter?variant=TRSM04E00P6M31SP Return to the guide: https://yenra.com/making/filtration.html