Images about accelerated process simulation, advanced wafer map pattern recognition, automated parameter optimization, cleanroom environmental control, cross-parameter correlation discovery, defect detection and classification, dynamic recipe tuning, early process drift detection, enhanced fault detection and classification fdc, equipment health monitoring, integration with digital twins, intelligent job scheduling and resource allocation, neural network-based apc advanced process control, overlay and alignment enhancement in lithography, predictive maintenance of equipment, predictive yield optimization, rapid root cause analysis, real-time adaptive process control, self-calibration of metrology tools, and virtual metrology and reduced measurement overhead.